Signia Technologies Inaugurates new 
China R&D Center

September 12th, 2004 Shanghai -- Signia Technologies celebrated the official inauguration for its new China R&D Center in Shanghai. Located in the Zhangjiang Hi-Tech Park, Pudong New Area, the facility will serve as the Signia’s primary development and technical service center in close collaboration with its R&D center in the US and platform development center in Taiwan.

The new site, expected to open in mid-2005, will develop innovative, state-of-the-art wireless semiconductor products with engineers recruited from leading Chinese universities. The establishment of the Signia China R&D center in Shanghai will further strengthen Signia's position in providing the best solutions in short range wireless semiconductor and software products.